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Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system |
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Titel: |
Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system |
Auteur: |
Milne, W.I Teo, K.B.K Chhowalla, M Amaratunga, G.A.J Yuan, J Robertson, J Legagneux, P Pirio, G Bouzehouane, Karim Pribat, D Bruenger, W Trautmann, C |
Verschenen in: |
Current applied physics |
Paginering: |
Jaargang 1 (2001) nr. 4-5 pagina's 4 p. |
Jaar: |
2001 |
Inhoud: |
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Uitgever: |
Elsevier Science B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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