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Journal description
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Details for article 15 of 51 found articles
| Title: |
Etch damage evaluation on (Bi4− x La x )Ti3O12 thin films during the etch process using inductively coupled plasma sources |
| Author: |
Kim, Jong-Gyu Kim, Gwan-Ha Kim, Kyoung-Tae Kim, Chang-Il |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 9 (2006) nr. 6 pages 7 p. |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 51 found articles
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