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Journal description
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Details for article 12 of 51 found articles
| Title: |
Electrical characterization of high-k gate dielectrics fabricated using plasma oxidation and post-deposition annealing of a Hf/SiO2/Si structure |
| Author: |
Sugimoto, Youhei Adachi, Hideto Yamamoto, Keisuke Wang, Dong Nakashima, Hideharu Nakashima, Hiroshi |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 9 (2006) nr. 6 pages 6 p. |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 51 found articles
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