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                                       Details for article 31 of 39 found articles
 
 
  Preparation of photosensitive polyimides (PSPIs) and their feasible evaluation for lithographic insulation patterns (LIPs) of integrated circuits (ICs) without negative photoresists
 
 
Title: Preparation of photosensitive polyimides (PSPIs) and their feasible evaluation for lithographic insulation patterns (LIPs) of integrated circuits (ICs) without negative photoresists
Author: Chen, Meng-Hsin
Lai, Chiu-Chun
Chen, Hsin-Lung
Lin, Yi-Hung
Huang, Kuan-Yeh
Lin, Chih-Hsiang
Hsiao, Ho-Ting
Liu, Lung-Chang
Chen, Chien-Ming
Appeared in: Materials science in semiconductor processing
Paging: Volume 88 () nr. C pages 132-138
Year: 2018
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 31 of 39 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands