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                                       Details for article 15 of 39 found articles
 
 
  Enhanced etching rate of black silicon by Cu/Ni Co-assisted chemical etching process
 
 
Title: Enhanced etching rate of black silicon by Cu/Ni Co-assisted chemical etching process
Author: Gao, Kai
Shen, Honglie
Liu, Youwen
Jiang, Ye
Zheng, Chaofan
Li, Yufang
Ren, Shuai
Huang, Chunlai
Appeared in: Materials science in semiconductor processing
Paging: Volume 88 () nr. C pages 250-255
Year: 2018
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 15 of 39 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands