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Journal description
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Details for article 11 of 57 found articles
| Title: |
Detection of nitrogen incorporation in nm-thin HfO2 layers on (100)Si by electron spin resonance |
| Author: |
Stesmans, A. Afanas’ev, V.V. Chen, F. Campbell, S.A. |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 7 (2004) nr. 4-6 pages 6 p. |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 11 of 57 found articles
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