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                                       Details for article 14 of 20 found articles
 
 
  Static and dynamic analysis of failure locations and void formation in interconnects due to various migration mechanisms
 
 
Title: Static and dynamic analysis of failure locations and void formation in interconnects due to various migration mechanisms
Author: Weide-Zaage, Kirsten
Dalleau, David
Yu, Xiaoying
Appeared in: Materials science in semiconductor processing
Paging: Volume 6 (2003) nr. 1-3 pages 8 p.
Year: 2003
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 14 of 20 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands