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                                       Details for article 10 of 14 found articles
 
 
  Influence of in-situ SiNx mask on the quality of N-polar GaN films
 
 
Title: Influence of in-situ SiNx mask on the quality of N-polar GaN films
Author: Yan, Long
Zhang, Yuantao
Xu, Heng
Li, Ling
Jiang, Junyan
Huang, Zhen
Han, Xu
Song, Junfeng
Du, Guotong
Appeared in: Materials science in semiconductor processing
Paging: Volume 59 (2017) nr. C pages 5 p.
Year: 2017
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 10 of 14 found articles
 
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