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                                       Details for article 15 of 77 found articles
 
 
  Effect of deposition temperature on polymorphous silicon thin films by PECVD: Role of hydrogen
 
 
Title: Effect of deposition temperature on polymorphous silicon thin films by PECVD: Role of hydrogen
Author: Hamui, L.
Monroy, B.M.
Kim, K.H.
López-Suárez, A.
Santoyo-Salazar, J.
López-López, M.
Roca i Cabarrocas, P.
Santana, G.
Appeared in: Materials science in semiconductor processing
Paging: Volume 41 (2016) nr. C pages 8 p.
Year: 2016
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 15 of 77 found articles
 
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