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Journal description
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Details for article 2 of 42 found articles
| Title: |
Atomic layer deposition of Ru/rutile Al-TiO2/Ru layer stacks for high-performance silicon capacitors |
| Author: |
Kim, Taehyun Lim, Da Eun Kim, Hyeongjun Nah, Hyunmin Park, Heun Chung, Yoon Jang Lee, Woongkyu |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 195 () nr. C pages p. |
| Year: |
2025 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 2 of 42 found articles
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