|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 7 of 49 found articles
| Title: |
Deposition of GeSn film on Si substrate by plasma-enhanced chemical vapor deposition using GeCl4 and SnCl4 in H2 for developing short-wave infrared Si photonics |
| Author: |
Yang, Tzu-Hung Lin, Zhe-Zhang Tsai, Shang-Che Dai, Jia-Zhi Chen, Shih-Ming Lin, Ming-Wei Chen, Szu-yuan |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 162 () nr. C pages p. |
| Year: |
2023 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 49 found articles
| << previous | next >> |