|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 70 of 114 found articles
| Title: |
Preparation, characterization and application of RF sputter deposited boron doped silicon dioxide thin films |
| Author: |
Tiwari, Ruchi Chandra, Sudhir Chakraborty, B.R. |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 16 (2013) nr. 6 pages 8 p. |
| Year: |
2013 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 70 of 114 found articles
| << previous | next >> |