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Journal description
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Details for article 2 of 19 found articles
| Title: |
Characteristics of germanium dry etching using inductively coupled SF6 plasma |
| Author: |
Shim, K-H. Kil, Y-H. Yang, H.D. Park, B.K. Yang, J-H. Kang, S. Jeong, T.S. Kim, Taek Sung |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 15 (2012) nr. 4 pages 7 p. |
| Year: |
2012 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 2 of 19 found articles
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