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Journal description
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Details for article 16 of 38 found articles
| Title: |
Hydrogen etching of 4H–SiC(0001) facet and step formation |
| Author: |
Li, Rui Zhang, Kaimin Zhang, Yi Zhang, Zhenzhen Ji, Peixuan Shi, Chengqian Hao, Danni Zhang, Yipeng Moro, Ramiro Ma, Yanqing Ma, Lei |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 149 () nr. C pages p. |
| Year: |
2022 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 16 of 38 found articles
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