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                                       Details for article 16 of 36 found articles
 
 
  High quality of N-polar GaN film fabricated by layer transfer technology using high selective material removal rate of CMP
 
 
Title: High quality of N-polar GaN film fabricated by layer transfer technology using high selective material removal rate of CMP
Author: Yu, Zicheng
Zhang, Li
Yu, Guohao
Deng, Xuguang
Jiang, Chunyu
Tang, Wenxin
Yin, Haotian
Liu, Weining
Chen, Zhang
Zhang, Baoshun
Appeared in: Materials science in semiconductor processing
Paging: Volume 141 () nr. C pages p.
Year: 2022
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 16 of 36 found articles
 
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