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High quality of N-polar GaN film fabricated by layer transfer technology using high selective material removal rate of CMP |
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Title: |
High quality of N-polar GaN film fabricated by layer transfer technology using high selective material removal rate of CMP |
Author: |
Yu, Zicheng Zhang, Li Yu, Guohao Deng, Xuguang Jiang, Chunyu Tang, Wenxin Yin, Haotian Liu, Weining Chen, Zhang Zhang, Baoshun |
Appeared in: |
Materials science in semiconductor processing |
Paging: |
Volume 141 () nr. C pages p. |
Year: |
2022 |
Contents: |
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Publisher: |
Elsevier Ltd |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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