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Journal description
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Details for article 21 of 61 found articles
| Title: |
High carrier mobility tungsten-doped indium oxide films prepared by reactive plasma deposition in pure argon and post annealing |
| Author: |
Gan, Tian Li, Jingmei Wu, Lili Zhang, Jingquan Hao, Xia Zhang, Qingyuan Li, Ruixing Shi, Wenhui |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 138 () nr. C pages p. |
| Year: |
2022 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 21 of 61 found articles
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