The Ge condensation technique: A solution for planar SOI/GeOI co-integration for advanced CMOS technologies?
Titel:
The Ge condensation technique: A solution for planar SOI/GeOI co-integration for advanced CMOS technologies?
Auteur:
Vincent, B. Damlencourt, J.F. Morand, Y. Pouydebasque, A. Le Royer, C. Clavelier, L. Dechoux, N. Rivallin, P. Nguyen, T. Cristoloveanu, S. Campidelli, Y. Rouchon, D. Mermoux, M. Deleonibus, S. Bensahel, D. Billon, T.