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Details for article 19 of 36 found articles
| Title: |
Leakage current lowering and film densification of ZrO2 high-k gate dielectrics by layer-by-layer, in-situ atomic layer hydrogen bombardment |
| Author: |
Huang, Kuei-Wen Chang, Teng-Jan Wang, Chun-Yuan Yi, Sheng-Han Wang, Chin-I. Jiang, Yu-Sen Yin, Yu-Tung Lin, Hsin-Chih Chen, Miin-Jang |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 109 () nr. C pages p. |
| Year: |
2020 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 19 of 36 found articles
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