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Journal description
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Details for article 8 of 26 found articles
| Title: |
Formation of contacts to shallow junctions using titanium silicide with diffusion barriers |
| Author: |
Zagozdzon-Wosik, W Rusakova, I Gooty, S.R Marton, D Li, J Zhang, Z.H Lin, C.-H Bleiler, R.J Zhang, D.X |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 1 (1998) nr. 3-4 pages 5 p. |
| Year: |
1998 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 26 found articles
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