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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 6 of 26 found articles
| Title: |
Effect of stress on silicide formation kinetics in thin film titanium–selicon system |
| Author: |
Nagabushnam, Rajan V Singh, Rajiv K Sharan, Sujit |
| Appeared in: |
Materials science in semiconductor processing |
| Paging: | Volume 1 (1998) nr. 3-4 pages 7 p. |
| Year: |
1998 |
| Contents: | |
| Publisher: |
Elsevier Science Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 26 found articles
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