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Influence of oxygen argon ratio on the structural, electrical, optical and thermoelectrical properties of Al-doped ZnO thin films |
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Titel: |
Influence of oxygen argon ratio on the structural, electrical, optical and thermoelectrical properties of Al-doped ZnO thin films |
Auteur: |
Li, L. Fang, L. Chen, X.M. Liu, J. Yang, F.F. Li, Q.J. Liu, G.B. Feng, S.J. |
Verschenen in: |
Physica. E, Low-dimensional systems and nanostructures |
Paginering: |
Jaargang 41 (2008) nr. 1 pagina's 6 p. |
Jaar: |
2008 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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