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Journal description
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Details for article 44 of 57 found articles
| Title: |
Polishing monoclonal antibody using pH-responsive TiO2/polysulfone membrane in dual size-exclusion strategy |
| Author: |
Melvin Ng, H.K. Leo, C.P. Lim, Theam Soon Low, S.C. Ooi, B.S. |
| Appeared in: |
Separation and purification technology |
| Paging: | Volume 213 (2019) nr. C pages 359-367 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 44 of 57 found articles
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