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Journal description
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Details for article 27 of 143 found articles
| Title: |
Design of a disulfide bond-containing photoresist with extremely low volume shrinkage and excellent degradation ability for UV-nanoimprinting lithography |
| Author: |
Zhang, Mingliang Jiang, Shengling Gao, Yanjing Nie, Jun Sun, Fang |
| Appeared in: |
Chemical engineering journal |
| Paging: | Volume 390 () nr. C pages p. |
| Year: |
2020 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 27 of 143 found articles
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