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Journal description
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Details for article 19 of 44 found articles
| Title: |
Electric field and temperature scaling of polarization reversal in silicon doped hafnium oxide ferroelectric thin films |
| Author: |
Zhou, Dayu Guan, Yan Vopson, Melvin M. Xu, Jin Liang, Hailong Cao, Fei Dong, Xianlin Mueller, Johannes Schenk, Tony Schroeder, Uwe |
| Appeared in: |
Acta Materialia |
| Paging: | Volume 99 () nr. C pages 240-246 |
| Year: |
2015 |
| Contents: | |
| Publisher: |
Acta Materialia Inc. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 19 of 44 found articles
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