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Transition from shear to stress-assisted diffusion of copper–chromium nanolayered thin films at elevated temperatures |
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Titel: |
Transition from shear to stress-assisted diffusion of copper–chromium nanolayered thin films at elevated temperatures |
Auteur: |
Raghavan, R. Wheeler, J.M. Harzer, T.P. Chawla, V. Djaziri, S. Thomas, K. Philippi, B. Kirchlechner, C. Jaya, B.N. Wehrs, J. Michler, J. Dehm, G. |
Verschenen in: |
Acta Materialia |
Paginering: |
Jaargang 100 () nr. C pagina's 73-80 |
Jaar: |
2015 |
Inhoud: |
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Uitgever: |
Acta Materialia Inc. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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