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                                       Details for article 37 of 72 found articles
 
 
  Interface property of silicon nitride films grown by inductively coupled plasma chemical vapor deposition and plasma enhanced chemical vapor deposition on In0.82Al0.18As
 
 
Title: Interface property of silicon nitride films grown by inductively coupled plasma chemical vapor deposition and plasma enhanced chemical vapor deposition on In0.82Al0.18As
Author: Shi, Ming
Tang, Hengjing
Shao, Xiumei
Huang, Xing
Cao, Gaoqi
Wang, Rui
Li, Tao
Li, Xue
Gong, Haimei
Appeared in: Infrared physics and technology
Paging: Volume 71 (2015) nr. C pages 5 p.
Year: 2015
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 37 of 72 found articles
 
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