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Artifact-free sample preparation of metal thin films using Xe plasma-focused ion beam milling for atomic resolution and in situ biasing analyses |
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Titel: |
Artifact-free sample preparation of metal thin films using Xe plasma-focused ion beam milling for atomic resolution and in situ biasing analyses |
Auteur: |
Lee, Hee-Beom Kim, Seon Je Jung, Min-Hyoung Kim, Young-Hoon Kim, Su Jae Gao, Hai-Feng Van Leer, Brandon Jeong, Se-Young Jeong, Hu Young Kim, Young-Min |
Verschenen in: |
Materials characterization |
Paginering: |
Jaargang 216 () nr. C pagina's p. |
Jaar: |
2024 |
Inhoud: |
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Uitgever: |
Elsevier Inc. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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