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Journal description
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Details for article 3 of 16 found articles
| Title: |
Characterization of the interface between the Hf-based high-k thin film and the Si using spatially resolved electron energy-loss spectroscopy |
| Author: |
Wang, X.F. Li, Quan Lee, P.F. Dai, J.Y. Gong, X.G. |
| Appeared in: |
Micron |
| Paging: | Volume 41 (2010) nr. 1 pages 5 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 16 found articles
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