Digital Library
Close Browse articles from a journal
 
<< previous    next >>
     Journal description
       All volumes of the corresponding journal
         All issues of the corresponding volume
           All articles of the corresponding issues
                                       Details for article 11 of 13 found articles
 
 
  The annealing behavior of hydrogen implanted into Al-1.5 at.% Si alloy
 
 
Title: The annealing behavior of hydrogen implanted into Al-1.5 at.% Si alloy
Author: Ogura, Masahiko
Nakatani, Norikazu
Yamaji, Norisuke
Imai, Makoto
Itoh, Akio
Imanishi, Nobutsugu
Appeared in: Radiation physics and chemistry
Paging: Volume 49 (1997) nr. 6 pages 5 p.
Year: 1997
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 11 of 13 found articles
 
<< previous    next >>
 
 Koninklijke Bibliotheek - National Library of the Netherlands