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                                       Details for article 20 of 75 found articles
 
 
  Electron beam lithography and reactive ion etching of nanometer size features in niobium films
 
 
Title: Electron beam lithography and reactive ion etching of nanometer size features in niobium films
Author: Piotrowski, T.T.
Piotrowska, A.
Kamińska, E.
Szopniewski, Z.
Koleśnik, S.
Wróbel, J.
Gierłowski, P.
Lewandowski, S.
Appeared in: Materials science and engineering. C, Biomimetic and supramolecular systems
Paging: Volume 15 (2001) nr. 1-2 pages 3 p.
Year: 2001
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 20 of 75 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands