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                                       Details for article 17 of 37 found articles
 
 
  DFT investigation of HfCl4 decomposition on hydroxylated SiO2: first stage of HfO2 atomic layer deposition
 
 
Title: DFT investigation of HfCl4 decomposition on hydroxylated SiO2: first stage of HfO2 atomic layer deposition
Author: Estève, A.
Djafari Rouhani, M.
Jeloaica, L.
Estève, D.
Appeared in: Computational materials science
Paging: Volume 27 (2003) nr. 1-2 pages 6 p.
Year: 2003
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 17 of 37 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands