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                                       Details for article 65 of 170 found articles
 
 
  Etching process of hydrogenated amorphous carbon (a-C:H) thin films in a dual ECR–r.f. nitrogen plasma
 
 
Title: Etching process of hydrogenated amorphous carbon (a-C:H) thin films in a dual ECR–r.f. nitrogen plasma
Author: Hong, Junegie
Turban, Guy
Appeared in: Diamond and related materials
Paging: Volume 8 (1999) nr. 2-5 pages 5 p.
Year: 1999
Contents:
Publisher: Elsevier Science S.A.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 65 of 170 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands