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                                       Details for article 26 of 33 found articles
 
 
  Structural analysis of a-C:H and a-C:H:Si films under high-pressure and high-temperature by synchrotron X-ray diffraction
 
 
Title: Structural analysis of a-C:H and a-C:H:Si films under high-pressure and high-temperature by synchrotron X-ray diffraction
Author: Hirayama, Tomoko
Eguchi, Yuri
Saeki, Koichi
Matsuoka, Takashi
Kikegawa, Takumi
Appeared in: Diamond and related materials
Paging: Volume 70 (2016) nr. C pages 8 p.
Year: 2016
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 26 of 33 found articles
 
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