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Journal description
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Details for article 6 of 19 found articles
| Title: |
Electrical properties of atomic layer deposited HfO2/Al2O3 multilayer on diamond |
| Author: |
Liu, Jiangwei Liao, Meiyong Imura, Masataka Oosato, Hirotaka Watanabe, Eiichiro Koide, Yasuo |
| Appeared in: |
Diamond and related materials |
| Paging: | Volume 54 (2015) nr. C pages 4 p. |
| Year: |
2015 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 19 found articles
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