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Journal description
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Details for article 8 of 27 found articles
| Title: |
Dependence of the gas composition in a microwave plasma-assisted diamond chemical vapor deposition reactor on the inlet carbon source: CH4 versus C2H2 |
| Author: |
McMaster, Mark C. Hsu, Wen L. Coltrin, Michael E. Dandy, David S. Fox, Ciaran |
| Appeared in: |
Diamond and related materials |
| Paging: | Volume 4 (1995) nr. 7 pages 9 p. |
| Year: |
1995 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 27 found articles
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