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Journal description
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Details for article 84 of 101 found articles
| Title: |
Study on the effect of process parameters and removal behavior of single-crystal SiC polishing based on a photocatalytic fixed polishing plate |
| Author: |
Lin, Chen Xie, Jilong Lu, Jiabin Yan, Qiusheng |
| Appeared in: |
Diamond and related materials |
| Paging: | Volume 153 () nr. C pages p. |
| Year: |
2025 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 84 of 101 found articles
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