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                                       Details for article 36 of 208 found articles
 
 
  Deposition of amorphous CN x by d.c. and rf plasma sputtering using a rf radical nitrogen beam source
 
 
Title: Deposition of amorphous CN x by d.c. and rf plasma sputtering using a rf radical nitrogen beam source
Author: Hayashi, Y.
Rahman, M.M.
Kaneko, K.
Soga, T.
Umeno, M.
Jimbo, T.
Appeared in: Diamond and related materials
Paging: Volume 11 (2002) nr. 3-6 pages 1178-1182
Year: 2002
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 36 of 208 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands