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                                       Details for article 6 of 221 found articles
 
 
  Amorphous Si x C1−x films: an example of materials presenting low indentation hardness and high wear resistance
 
 
Title: Amorphous Si x C1−x films: an example of materials presenting low indentation hardness and high wear resistance
Author: Esteve, J.
Lousa, A.
Martinez, E.
Huck, H.
Halac, E.B.
Reinoso, M.
Appeared in: Diamond and related materials
Paging: Volume 10 (2001) nr. 3-7 pages 5 p.
Year: 2001
Contents:
Publisher: Elsevier Science B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 6 of 221 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands