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Journal description
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Details for article 39 of 69 found articles
| Title: |
Influence of gas phase parameters on the deposition kinetics and morphology of thin diamond films deposited by HFCVD and MWCVD technique |
| Author: |
Beckmann, R. Kulisch, W. Frenck, H.J. Kassing, R. |
| Appeared in: |
Diamond and related materials |
| Paging: | Volume 1 (1992) nr. 2-4 pages 4 p. |
| Year: |
1992 |
| Contents: | |
| Publisher: |
Elsevier Science Publishers B.V. All rights reserved |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 39 of 69 found articles
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