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  Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
 
 
Title: Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
Author: Ulliac, G.
Calero, V.
Ndao, A.
Baida, F.I.
Bernal, M.-P.
Appeared in: Optical materials
Paging: Volume 53 (2016) nr. C pages 1-5
Year: 2016
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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