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Journal description
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Details for article 40 of 41 found articles
| Title: |
The threshold effect of incident exposure energy flux for photorefractive light-induced scattering in doped lithium niobate crystals |
| Author: |
Sun, Xiudong Luo, Suhua Wang, Jian Shi, Hongxin Jiang, Yongyuan |
| Appeared in: |
Optical materials |
| Paging: | Volume 31 (2009) nr. 11 pages 6 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 40 of 41 found articles
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