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Journal description
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Details for article 8 of 22 found articles
| Title: |
Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography |
| Author: |
Arsh, A Klebanov, M Lyubin, V Shapiro, L Feigel, A Veinger, M Sfez, B |
| Appeared in: |
Optical materials |
| Paging: | Volume 26 (2004) nr. 3 pages 4 p. |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 22 found articles
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