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Journal description
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Details for article 57 of 110 found articles
| Title: |
In-situ PECVD-based stoichiometric SiO2 layer for semiconductor devices |
| Author: |
Pham, Duy Phong Kim, Hongrae Choi, Jiwon Oh, Donghyun Chung, Yung-Bin Jeon, Woo-Seok Jo, Jungyun Dao, Vinh-Ai Dhungel, Suresh Kumar Yi, Junsin |
| Appeared in: |
Optical materials |
| Paging: | Volume 137 () nr. C pages p. |
| Year: |
2023 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 57 of 110 found articles
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