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Argon and oxygen pressure influence on the properties of NiO films deposited by magnetron sputtering in layer-by-layer growth regime |
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Titel: |
Argon and oxygen pressure influence on the properties of NiO films deposited by magnetron sputtering in layer-by-layer growth regime |
Auteur: |
Karpyna, V.A. Ievtushenko, A.I. Bykov, O.I. Kolomys, O.F. Strelchuk, V.V. Starik, S.P. Baturin, V.A. Karpenko, O.Yu. Lytvyn, O.S. |
Verschenen in: |
Physica. B, Condensed matter |
Paginering: |
Jaargang 678 () nr. C pagina's p. |
Jaar: |
2024 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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