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Journal description
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Details for article 296 of 831 found articles
| Title: |
Growth kinetics study of SiGe alloys deposited by rapid thermal process, very low pressure chemical vapor deposition |
| Author: |
Gu, Shulin Zheng, Youdou Zhang, Rong Wang, Ronghua |
| Appeared in: |
Physica. B, Condensed matter |
| Paging: | Volume 229 (1996) nr. 1 pages 5 p. |
| Year: |
1996 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 296 of 831 found articles
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