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Details for article 381 of 6539 found articles
| Title: |
Argon and oxygen pressure influence on the properties of NiO films deposited by magnetron sputtering in layer-by-layer growth regime |
| Author: |
Karpyna, V.A. Ievtushenko, A.I. Bykov, O.I. Kolomys, O.F. Strelchuk, V.V. Starik, S.P. Baturin, V.A. Karpenko, O.Yu. Lytvyn, O.S. |
| Appeared in: |
Physica. B, Condensed matter |
| Paging: | Volume 678 () nr. C pages p. |
| Year: |
2024 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 381 of 6539 found articles
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