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                                       Details for article 18010 of 18303 found articles
 
 
  Verification of Fowler–Nordheim electron tunneling mechanism in Ni/SiO2/n-4H SiC and n + poly-Si/SiO2/n-4H SiC MOS devices by different models
 
 
Title: Verification of Fowler–Nordheim electron tunneling mechanism in Ni/SiO2/n-4H SiC and n + poly-Si/SiO2/n-4H SiC MOS devices by different models
Author: Kodigala, Subba Ramaiah
Appeared in: Physica. B, Condensed matter
Paging: Volume 500 (2016) nr. C pages 9 p.
Year: 2016
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 18010 of 18303 found articles
 
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