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Journal description
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Details for article 8 of 75 found articles
| Title: |
A new UV lithography photoresist based on composite of EPON resins 165 and 154 for fabrication of high-aspect-ratio microstructures |
| Author: |
Yang, Ren Soper, Steven A. Wang, Wanjun |
| Appeared in: |
Sensors and Actuators. A, Physical |
| Paging: | Volume 135 (2007) nr. 2 pages 12 p. |
| Year: |
2007 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 75 found articles
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