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Stoichiometric and non-stoichiometric films in the Si–O–N system: mechanical, electrical, and dielectric properties |
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Titel: |
Stoichiometric and non-stoichiometric films in the Si–O–N system: mechanical, electrical, and dielectric properties |
Auteur: |
Torrison, L Tolle, J Kouvetakis, J Dey, S.K Gu, D Tsong, I.S.T Crozier, P.A |
Verschenen in: |
Materials science and engineering. B, Solid-state materials for advanced technology |
Paginering: |
Jaargang 97 (2003) nr. 1 pagina's 5 p. |
Jaar: |
2003 |
Inhoud: |
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Uitgever: |
Elsevier Science B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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