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Microwave performance of recessed gate Al0.2Ga0.8N/GaN HFETs fabricated using a photoelectrochemical etching technique |
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Titel: |
Microwave performance of recessed gate Al0.2Ga0.8N/GaN HFETs fabricated using a photoelectrochemical etching technique |
Auteur: |
Kim, Jong-Wook Lee, Jae-Seung Lee, Won-Sang Shin, Jin-Ho Jung, Doo-Chan Shin, Moo-Whan Kim, Chang-Seok Oh, Jae-Eung Lee, Jung-Hee Hahm, Sung-Ho |
Verschenen in: |
Materials science and engineering. B, Solid-state materials for advanced technology |
Paginering: |
Jaargang 95 (2002) nr. 1 pagina's 4 p. |
Jaar: |
2002 |
Inhoud: |
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Uitgever: |
Elsevier Science B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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